Major Experimental Facilities
Growth and Processing:
• CVD Reactors for 2D materials. 3 Nos.
• RF Magnetron Co-sputtering system ( 3 Systems), PECVD system
• Autoclave, Fumehood, Glove box, High temperature Furnaces ( up to 1400 ℃)
• Rapid Thermal Annealing (RTA) system
• Plasma etching/cleaning, Ultrasmall Nanoparticle deposition system, Freeze Dryer
• Ball Milling, Spin coating, Tip sonicator
• Thermal Evaporation, E-beam deposition system, organic evaporator
Characterization facilities:
• CCD based Laser Raman and Photoluminescence setup
• Fluoroscence spectrometer, Xe lamp & UV lasers, ns pulsed laser
• Photo I-V and Photoresponse, Microprobe station , PV Quantum Efficiency Meas. system
• Solar simulator, Reference Solar cell kit, Hall effect (high temperature)
• CCR Cryostat (Optical), Liquid Nitrogen Cryostat (Optical)
• High frequency C-V, I-V measurement, Function generator
• Gas sensing system, Photocatalysis (UV, visible, NIR)
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Central Facilities: AFM, TERS, Confocal Microscope, FESEM, TEM, Ellipsometer, TGA, Micro-
Raman, VSM, FTIR, E-bam lithography, PPMS etc.