Automated ultra-high vacuum (UHV) X-ray photoelectron spectroscopy
Working Principle:
X-ray Photoelectron Spectroscopy (XPS) is a widely used surface analysis technique that can be applied to a broad range of materials, providing valuable quantitative and chemical state information from the surface. The average depth of analysis for XPS is approximately 5 nm. The VersaProbe III features PHI's patented, monochromatic, micro-focused, scanning x-ray source, offering excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling, and imaging can all be performed across various x-ray beam sizes, including a minimum beam size of less than 10 µm. Spatial distribution information is obtained by scanning the micro-focused X-ray beam across the sample surface, while depth distribution information is obtained by combining XPS measurements with ion milling (sputtering) to characterize thin film structures.
The XPS at IIT Guwahati is used for academic and research activities. It provides critical information for many research applications where surface or thin film composition is crucial, including nano-materials, photovoltaics, catalysis, corrosion, adhesion, electronic devices and packaging, magnetic media, display technology, surface treatments, and thin film coatings.
Make: M/s Physical Electronics, USA; Model: PHI 5000 versa probe III
General Information: Monochromatic micro-focus XPS system with high degree of automation and state-of-the-art data system enabling:
• XPS (X-ray Photoelectron Spectroscopy)
• XPS mapping
• Advanced depth profiling and surface cleaning sputter ion gun
• Vacuum transfer module for handling air-sensitive samples
• ARXPS (Angle Resolved XPS)
Instrument In-Charge- S. Sarma
In-charge Email Id :- sida@iitg.ac.in
Instrument Co- InCharge- C. Borgohain
Office Contact Number: 03612583105
Instrument Status: Working